Strength Evaluation Test of Hot-pressed Silicon Nitride at Room Temperature

Modeling the strain-rate dependence of fatigue life of hot- pressed silicon nitride

This paper presents the results of a micromechanical model used to explain the strain-rate dependence of the compression fatigue lives of amorphous and crystalline grain boundary phase; denoted by ABP and CBP silicon nitrides, respectively. When the strain-rate is changed from 400 to 0.01/s, the fatigue lives of both materials, evaluated at a peak stress of 3.2 GPa, increased by more than two o...

Shear Strength of Exterior Plywood Panels Pressed at Low Temperature

Plywood manufactured from thin veneer sheets of different species is one of the most traditional structural composite panels. The objective of this study was to produce experimental plywood panels using a temperature of 100 °C, which is 10 to 30% lower than typical press temperature of plywood manufacture. It was determined that shear strength characteristics of the samples were not adversely i...

Plasma anodization of silicon at room temperature

2014 Room temperature plasma anodization of silicon (growth rate of a few nm/min.) is possible through a thin calcia stabilized zirconia (CSZ) layer. The anodization kinetics, the composition and the electrical properties of the anodic SiO2 films are studied. Constant voltage or low current anodization lead to quasi defect free films with reduced surface roughness. The dielectric breakdown fiel...

Dynamic Multiaxial Response of a Hot-Pressed Aluminum Nitride

Silicon nitride deposited by ECR–CVD at room temperature for LOCOS isolation technology

For LOCOS application, silicon nitride (SiNx) insulators have been deposited by ECR–CVD at room temperature and with N2 flows of 2.5, 5, 10 and 20 sccm on pad-SiO2/Si or on Si substrates. The obtained SiNx/Si structures were used to analyze the SiNx characteristics. FTIR analyses reveal the presence of Si–N and N–H bonds. The refractive indexes between 1.88 and 2.48 and the thickness between 12...